Growth of Tetragonal Si via Plasma-Enhanced Epitaxy
Submitted by maurice on Tue, 2018-10-30 17:25
| Title | Growth of Tetragonal Si via Plasma-Enhanced Epitaxy |
| Publication Type | Journal Article |
| Year of Publication | 2017 |
| Authors | Chen, W, Hamon, G, Leal, R, Maurice, J-L, Largeau, L, Cabarrocas, PRoca i |
| Journal | Crystal Growth & Design |
| Volume | 17 |
| Issue | 8 |
| Pagination | 4265 - 4269 |
| Date Published | Feb-08-2017 |
| ISSN | 1528-7483 |
| URL | http://pubs.acs.org/doi/10.1021/acs.cgd.7b00601http://pubs.acs.org/doi/pdf/10.1021/acs.cgd.7b00601 |
| DOI | 10.1021/acs.cgd.7b00601 |
| Short Title | Crystal Growth & Design |
Projects:
